Invention Grant
- Patent Title: Compound semiconductor device and method for manufacturing the same
- Patent Title (中): 复合半导体器件及其制造方法
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Application No.: US13352645Application Date: 2012-01-18
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Publication No.: US08502270B2Publication Date: 2013-08-06
- Inventor: Sanae Shimizu , Atsushi Yamada
- Applicant: Sanae Shimizu , Atsushi Yamada
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2011-029093 20110214
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A compound semiconductor device including: a substrate; an electron transit layer formed on and above the substrate; and an electron supply layer formed on and above the electron transit layer, wherein a first region or regions having a smaller thermal expansion coefficient than the electron transit layer and a second region or regions having a larger thermal expansion coefficient than the electron transit layer are mixedly present on a surface of the substrate.
Public/Granted literature
- US20120205718A1 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2012-08-16
Information query
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