Invention Grant
US08502279B2 Nano-electro-mechanical system (NEMS) structures with actuatable semiconductor fin on bulk substrates
有权
纳米机电系统(NEMS)结构,其具有可驱动的散装衬底上的半导体鳍片
- Patent Title: Nano-electro-mechanical system (NEMS) structures with actuatable semiconductor fin on bulk substrates
- Patent Title (中): 纳米机电系统(NEMS)结构,其具有可驱动的散装衬底上的半导体鳍片
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Application No.: US13108439Application Date: 2011-05-16
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Publication No.: US08502279B2Publication Date: 2013-08-06
- Inventor: Eng Huat Toh , Elgin Quek , Chung Foong Tan
- Applicant: Eng Huat Toh , Elgin Quek , Chung Foong Tan
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Ditthavong Mori & Steiner, P.C.
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01L29/66 ; H01L21/00 ; H01L21/338 ; H01L21/336

Abstract:
Semiconductor devices are formed with a nano-electro-mechanical system (NEMS) logic or memory on a bulk substrate. Embodiments include forming source/drain regions directly on a bulk substrate, forming a fin connecting the source/drain regions, forming two gates, one on each side of the fin, the two gates being insulated from the bulk substrate, and forming a substrate gate in the bulk substrate. The fin is separated from each of the two gates and the substrate gate with an air gap.
Public/Granted literature
- US20120292707A1 NANO-ELECTRO-MECHANICAL SYSTEM (NEMS) STRUCTURES ON BULK SUBSTRATES Public/Granted day:2012-11-22
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