Invention Grant
- Patent Title: Micro-electro-mechanical systems (MEMS) device and method for fabricating the same
- Patent Title (中): 微机电系统(MEMS)装置及其制造方法
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Application No.: US13224297Application Date: 2011-09-01
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Publication No.: US08502329B2Publication Date: 2013-08-06
- Inventor: Tsung-Min Hsieh , Chien-Hsing Lee , Jhyy-Cheng Liou
- Applicant: Tsung-Min Hsieh , Chien-Hsing Lee , Jhyy-Cheng Liou
- Applicant Address: TW Hsinchu
- Assignee: Solid State System Co., Ltd.
- Current Assignee: Solid State System Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H01L29/84
- IPC: H01L29/84

Abstract:
A MEMS device includes a substrate. The substrate has a plurality of through holes in the substrate within a diaphragm region and optionally an indent space from the second surface at the diaphragm region. A first dielectric structural layer is then disposed over the substrate from the first surface, wherein the first dielectric structural layer has a plurality of openings corresponding to the through holes, wherein each of the through holes remains exposed by the first dielectric structural layer. A second dielectric structural layer with a chamber is disposed over the first dielectric structural layer, wherein the chamber exposes the openings of the first dielectric structural layer and the through holes of the substrate to connect to the indent space. A MEMS diaphragm is embedded in the second dielectric structural layer above the chamber, wherein an air gap is formed between the substrate and the MEMS diaphragm.
Public/Granted literature
- US20130056841A1 MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2013-03-07
Information query
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