Invention Grant
- Patent Title: Radiation source apparatus and DUV beam generation method
- Patent Title (中): 辐射源装置和DUV光束产生方法
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Application No.: US13075797Application Date: 2011-03-30
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Publication No.: US08503068B2Publication Date: 2013-08-06
- Inventor: Jun Sakuma
- Applicant: Jun Sakuma
- Applicant Address: JP Kanagawa
- Assignee: Lasertec Corporation
- Current Assignee: Lasertec Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Carrier Blackman & Associates, P.C.
- Agent Joseph P. Carrier; William D. Blackman
- Priority: JP2010-085070 20100401
- Main IPC: G02F1/35
- IPC: G02F1/35 ; H01S3/10

Abstract:
The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm.
Public/Granted literature
- US20120026578A1 RADIATION SOURCE APPARATUS AND DUV BEAM GENERATION METHOD Public/Granted day:2012-02-02
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