Invention Grant
US08504194B2 Substrate processing apparatus and substrate transport method 有权
基板加工装置及基板输送方法

Substrate processing apparatus and substrate transport method
Abstract:
A substrate processing apparatus includes: a plurality of substrate processing sections arranged alongside a transport passage; a standby mechanism which retains a substrate in standby, the standby mechanism being movable along the transport passage; a transport mechanism which transports the substrate between the standby mechanism and each of the substrate processing sections, the transport mechanism being movable along the transport passage; a first movement mechanism which moves the transport mechanism along the transport passage; and a second movement mechanism which moves the standby mechanism along the transport passage.
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