Invention Grant
- Patent Title: Substrate processing apparatus and substrate transport method
- Patent Title (中): 基板加工装置及基板输送方法
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Application No.: US12722063Application Date: 2010-03-11
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Publication No.: US08504194B2Publication Date: 2013-08-06
- Inventor: Ichiro Mitsuyoshi
- Applicant: Ichiro Mitsuyoshi
- Applicant Address: JP
- Assignee: Dainippon Screen MFG. Co., Ltd.
- Current Assignee: Dainippon Screen MFG. Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2009-082844 20090330
- Main IPC: B65H1/00
- IPC: B65H1/00 ; G06F7/00

Abstract:
A substrate processing apparatus includes: a plurality of substrate processing sections arranged alongside a transport passage; a standby mechanism which retains a substrate in standby, the standby mechanism being movable along the transport passage; a transport mechanism which transports the substrate between the standby mechanism and each of the substrate processing sections, the transport mechanism being movable along the transport passage; a first movement mechanism which moves the transport mechanism along the transport passage; and a second movement mechanism which moves the standby mechanism along the transport passage.
Public/Granted literature
- US20100249993A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSPORT METHOD Public/Granted day:2010-09-30
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