Invention Grant
US08504333B2 Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method
有权
用于选择衬底上的样品位置的方法，用于提供衬底的性质模型的表示的方法，提供衬底跨过衬底的性质变化的表示的方法和器件制造方法
- Patent Title: Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method
- Patent Title (中): 用于选择衬底上的样品位置的方法，用于提供衬底的性质模型的表示的方法，提供衬底跨过衬底的性质变化的表示的方法和器件制造方法
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Application No.: US12816723Application Date: 2010-06-16
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Publication No.: US08504333B2Publication Date: 2013-08-06
- Inventor: Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
- Applicant: Everhardus Cornelis Mos , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G06F7/60
- IPC: G06F7/60 ; G06F17/10
Abstract:
A method for selecting sample positions on a substrate from a set of all available sample positions is provided, in which a representation of a model, which may represent the variation of one or more properties across the substrate, is analyzed in order to identify the sample positions having the greatest effect on the model.
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