Invention Grant
- Patent Title: Standard cells having flexible layout architecture/boundaries
- Patent Title (中): 具有灵活布局架构/边界的标准单元
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Application No.: US12697887Application Date: 2010-02-01
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Publication No.: US08504972B2Publication Date: 2013-08-06
- Inventor: Yung-Chin Hou , David Barry Scott , Lee-Chung Lu , Li-Chun Tien
- Applicant: Yung-Chin Hou , David Barry Scott , Lee-Chung Lu , Li-Chun Tien
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
An integrated circuit layout includes a standard cell, which includes a first gate strip and a second gate strip parallel to each other and having a gate pitch; a first boundary and a second boundary on opposite ends of the first standard cell; and a third boundary and a fourth boundary on opposite ends of the first standard cell and parallel to the first gate strip and the second gate strip. A cell pitch between the third boundary and the fourth boundary is not equal to integer times the gate pitch. A PMOS transistor is formed of the first gate strip and a first active region. An NMOS transistor is formed of the first gate strip and a second active region.
Public/Granted literature
- US20100269081A1 Standard Cells Having Flexible Layout Architecture/Boundaries Public/Granted day:2010-10-21
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