Invention Grant
- Patent Title: Methods of fabricating multilayer substrates
- Patent Title (中): 制造多层基板的方法
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Application No.: US12851227Application Date: 2010-08-05
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Publication No.: US08505197B2Publication Date: 2013-08-13
- Inventor: Chrystelle Lagahe Blanchard
- Applicant: Chrystelle Lagahe Blanchard
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR0956700 20090928
- Main IPC: H05K3/36
- IPC: H05K3/36

Abstract:
A method of fabricating a multilayer substrate may include bonding a front face of a donor substrate to a front face of a receiver substrate by molecular adhesion to form a stack and applying a heat treatment to the stack to consolidate a bond interface between the donor substrate and the receiver substrate. The method may further include thinning a back face of the donor substrate, trimming a periphery of the donor substrate and at least a portion of a periphery of the receiver substrate, and etching the back face of the donor substrate, the periphery of the donor substrate, and the at least a portion of the periphery of the receiver substrate subsequent to thinning the back face of the donor substrate and trimming the periphery of the donor substrate and the at least a portion of the periphery of the receiver substrate.
Public/Granted literature
- US20110076849A1 PROCESS FOR BONDING AND TRANSFERRING A LAYER Public/Granted day:2011-03-31
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