Invention Grant
- Patent Title: Wall structures for a semiconductor wafer
- Patent Title (中): 半导体晶圆的壁结构
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Application No.: US11548624Application Date: 2006-10-11
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Publication No.: US08507302B1Publication Date: 2013-08-13
- Inventor: Chen-Fu Chu , Hao-Chun Cheng , Trung Tri Doan , Feng-Hsu Fan
- Applicant: Chen-Fu Chu , Hao-Chun Cheng , Trung Tri Doan , Feng-Hsu Fan
- Applicant Address: TW Miao-Li County
- Assignee: SemiLEDs Optoelectronics Co., Ltd.
- Current Assignee: SemiLEDs Optoelectronics Co., Ltd.
- Current Assignee Address: TW Miao-Li County
- Agency: Patterson & Sheridan, L.L.P.
- Main IPC: H01L21/301
- IPC: H01L21/301

Abstract:
Techniques for fabricating metal devices, such as vertical light-emitting diode (VLED) devices, power devices, laser diodes, and vertical cavity surface emitting laser devices, are provided. Devices produced accordingly may benefit from greater yields and enhanced performance over conventional metal devices, such as higher brightness of the light-emitting diode and increased thermal conductivity. Moreover, the invention discloses techniques in the fabrication arts that are applicable to GaN-based electronic devices in cases where there is a high heat dissipation rate of the metal devices that have an original non- (or low) thermally conductive and/or non- (or low) electrically conductive carrier substrate that has been removed.
Information query
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