Invention Grant
- Patent Title: Inductive modulation of focusing voltage in charged beam system
- Patent Title (中): 电荷束系统中聚焦电压的感应调制
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Application No.: US13192903Application Date: 2011-07-28
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Publication No.: US08507855B2Publication Date: 2013-08-13
- Inventor: Tuvia Biber , Efim Kerner
- Applicant: Tuvia Biber , Efim Kerner
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01J3/14
- IPC: H01J3/14 ; H01J37/26
Abstract:
A modulator of a charged particle beam system is arranged to generate a modulation signal that is provided to an inductor, which receives the modulation signal and modulates, by inductance, a supply voltage signal for the charged particle beam system. Modulation of the supply voltage signal changes a focal length of a charged particle beam produced by the charged particle beam system.
Public/Granted literature
- US20130026362A1 SYSTEM AND METHOD FOR FAST DISCHARGING OF AN INSPECTED OBJECT Public/Granted day:2013-01-31
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