Invention Grant
- Patent Title: Radiation source and lithographic apparatus
- Patent Title (中): 辐射源和光刻设备
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Application No.: US12543578Application Date: 2009-08-19
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Publication No.: US08507882B2Publication Date: 2013-08-13
- Inventor: Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- Applicant: Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; H01J19/12
Abstract:
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
Public/Granted literature
- US20100053581A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS Public/Granted day:2010-03-04
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