Invention Grant
- Patent Title: Electrostatic discharge protection device
- Patent Title (中): 静电放电保护装置
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Application No.: US13040415Application Date: 2011-03-04
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Publication No.: US08507946B2Publication Date: 2013-08-13
- Inventor: Yeh-Jen Huang , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
- Applicant: Yeh-Jen Huang , Yeh-Ning Jou , Ming-Dou Ker , Wen-Yi Chen , Chia-Wei Hung , Hwa-Chyi Chiou
- Applicant Address: TW Hsinchu TW Hsinchu
- Assignee: Vanguard International Semiconductor Corporation,National Chiao Tung University
- Current Assignee: Vanguard International Semiconductor Corporation,National Chiao Tung University
- Current Assignee Address: TW Hsinchu TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW99143641A 20101214
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L31/111 ; H01L23/62

Abstract:
An electrostatic discharge (ESD) protection device including a substrate, a first doped region, a second doped region, and a third doped region, a gate and a plurality of contacts is disclosed. The substrate includes a first conductive type. The first doped region is formed in the substrate and includes a second conductive type. The second doped region is formed in the substrate and includes the second conductive type. The third doped region is formed in the substrate, includes the first conductive type and is located between the first and the second doped regions. The gate is formed on the substrate, located between the first and the second doped regions and comprises a first through hole. The contacts pass through the first through hole to contact with the third doped region.
Public/Granted literature
- US20120146151A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE Public/Granted day:2012-06-14
Information query
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