Invention Grant
- Patent Title: Circuit substrate and method of manufacturing same
- Patent Title (中): 电路基板及其制造方法
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Application No.: US13371323Application Date: 2012-02-10
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Publication No.: US08508046B2Publication Date: 2013-08-13
- Inventor: Masao Sakuma , Kanji Otsuka
- Applicant: Masao Sakuma , Kanji Otsuka
- Applicant Address: JP Tokyo
- Assignee: DISCO Corporation
- Current Assignee: DISCO Corporation
- Current Assignee Address: JP Tokyo
- Agency: Silicon Valley Patent Group LLP
- Priority: JP2009-203084 20090813; JP2010-012589 20100122; JP2010-029449 20100212; JP2010-056710 20100312; JP2010-056711 20100312; JP2010-056712 20100312; JP2010-181464 20100813; JP2010-181465 20100813; JP2010-181466 20100813; JP2010-181467 20100813; JP2010-181468 20100813
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L23/00

Abstract:
A circuit substrate is presented. The circuit substrate comprises internal terminal electrode 2; a substrate 1; a wiring layer 21 formed on a portion of the surface of the substrate and having one end thereof connected to the internal terminal electrode; an insulating film contacting as a surface with the wiring layer; and an external terminal electrode 9 connected to the other end of the wiring layer and used for connecting to the exterior. The angle of the cross-section of the wiring layer taken perpendicularly to the surface of the substrate in the edge portion that the wiring layer contains is 55° (55 degree) or less, and the wiring layer that contains multiple mutually independent columnar crystals extending perpendicularly in a direction different from the direction of the surface of the substrate.
Public/Granted literature
- US20120193799A1 Circuit substrate and method of manufacturing same Public/Granted day:2012-08-02
Information query
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