Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and device manufacturing method
- Patent Title (中): 流体处理结构，光刻设备和器件制造方法
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Application No.: US12582919Application Date: 2009-10-21
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Publication No.: US08508712B2Publication Date: 2013-08-13
- Inventor: Clemens Johannes Gerardus Van Den Dungen , Danny Maria Hubertus Philips , Koen Steffens , Tijmen Wilfred Mathijs Gunther , David Bessems
- Applicant: Clemens Johannes Gerardus Van Den Dungen , Danny Maria Hubertus Philips , Koen Steffens , Tijmen Wilfred Mathijs Gunther , David Bessems
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54 ; G03B27/58 ; G03B27/32 ; G03B27/68 ; G03B27/42
Abstract:
A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
Public/Granted literature
- US20100103391A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-04-29
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