Invention Grant
US08508713B2 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method for producing device
- Patent Title (中): 曝光装置，曝光方法和制造装置的方法
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Application No.: US11878075Application Date: 2007-07-20
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Publication No.: US08508713B2Publication Date: 2013-08-13
- Inventor: Hiroyuki Nagasaka , Takeshi Okuyama
- Applicant: Hiroyuki Nagasaka , Takeshi Okuyama
- Applicant Address: JP Tokyo JP Yokohama
- Assignee: Nikon Corporation,Nikon Engineering Co., Ltd.
- Current Assignee: Nikon Corporation,Nikon Engineering Co., Ltd.
- Current Assignee Address: JP Tokyo JP Yokohama
- Agency: Oliff & Berridge, PLC.
- Priority: JP2004-172569 20040610; JP2004-245260 20040825; JP2004-330582 20041115
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
Public/Granted literature
- US20070263195A1 Exposure apparatus, exposure method, and method for producing device Public/Granted day:2007-11-15
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