Invention Grant
US08508886B2 Use of magnetic material for RIE stop layer during damascene main pole formation
有权
在镶嵌主磁极形成期间使用磁性材料作为RIE停止层
- Patent Title: Use of magnetic material for RIE stop layer during damascene main pole formation
- Patent Title (中): 在镶嵌主磁极形成期间使用磁性材料作为RIE停止层
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Application No.: US13247883Application Date: 2011-09-28
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Publication No.: US08508886B2Publication Date: 2013-08-13
- Inventor: Yingjian Chen , Shiwen Huang , Edward Hin Pong Lee , Mun Hyoun Park , Kyusik Shin , Yuming Zhou
- Applicant: Yingjian Chen , Shiwen Huang , Edward Hin Pong Lee , Mun Hyoun Park , Kyusik Shin , Yuming Zhou
- Applicant Address: NL Amsterdam
- Assignee: HGST Netherlands B.V.
- Current Assignee: HGST Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Patterson & Sheridan, LLP
- Main IPC: G11B5/31
- IPC: G11B5/31

Abstract:
A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
Public/Granted literature
- US20130078483A1 USE OF MAGNETIC MATERIAL FOR RIE STOP LAYER DURING DAMASCENE MAIN POLE FORMATION Public/Granted day:2013-03-28
Information query
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