Invention Grant
US08522712B2 Template treatment method, program, computer storage medium, template treatment apparatus and imprint system
失效
模板处理方法，程序，计算机存储介质，模板处理装置和压印系统
- Patent Title: Template treatment method, program, computer storage medium, template treatment apparatus and imprint system
- Patent Title (中): 模板处理方法，程序，计算机存储介质，模板处理装置和压印系统
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Application No.: US12943204Application Date: 2010-11-10
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Publication No.: US08522712B2Publication Date: 2013-09-03
- Inventor: Koukichi Hiroshiro , Takanori Nishi , Takahiro Kitano , Shoichi Terada
- Applicant: Koukichi Hiroshiro , Takanori Nishi , Takahiro Kitano , Shoichi Terada
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2009-263562 20091119; JP2009-263563 20091119; JP2010-226191 20101006
- Main IPC: B05C5/02
- IPC: B05C5/02
Abstract:
In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.
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