Invention Grant
- Patent Title: Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
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Application No.: US12954485Application Date: 2010-11-24
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Publication No.: US08524095B2Publication Date: 2013-09-03
- Inventor: Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
- Applicant: Liubo Hong , Fenglin Liu , Qiping Zhong , Honglin Zhu
- Applicant Address: NL Amsterdam
- Assignee: HGST Netherlands B.V.
- Current Assignee: HGST Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Patterson & Sheridan, LLP
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
Public/Granted literature
- US20120125886A1 PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) Public/Granted day:2012-05-24
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