Invention Grant
- Patent Title: Group III nitride crystal and method for producing the same
- Patent Title (中): III族氮化物晶体及其制造方法
-
Application No.: US13338263Application Date: 2011-12-28
-
Publication No.: US08524575B2Publication Date: 2013-09-03
- Inventor: Koji Uematsu , Hideki Osada , Seiji Nakahata , Shinsuke Fujiwara
- Applicant: Koji Uematsu , Hideki Osada , Seiji Nakahata , Shinsuke Fujiwara
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Judge Patent Associates
- Priority: JP2009-154020 20090629; JP2009-204979 20090904
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/20 ; H01L21/20 ; H01L21/06

Abstract:
A method for producing a group III nitride crystal in the present invention includes the steps of cutting a plurality of group III nitride crystal substrates 10p and 10q having a main plane from a group III nitride bulk crystal 1, the main planes 10pm and 10qm having a plane orientation with an off-angle of five degrees or less with respect to a crystal-geometrically equivalent plane orientation selected from the group consisting of {20-21}, {20-2-1}, {22-41}, and {22-4-1}, transversely arranging the substrates 10p and 10q adjacent to each other such that the main planes 10pm and 10qm of the substrates 10p and 10q are parallel to each other and each [0001] direction of the substrates 10p and 10q coincides with each other, and growing a group III nitride crystal 20 on the main planes 10pm and 10qm of the substrates 10p and 10q.
Public/Granted literature
- US20120329245A1 Group III Nitride Crystal and Method for Producing the Same Public/Granted day:2012-12-27
Information query
IPC分类: