Invention Grant
- Patent Title: Solid-state imaging device, method for manufacturing the same, and electronic apparatus
- Patent Title (中): 固态成像装置及其制造方法以及电子装置
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Application No.: US13137775Application Date: 2011-09-12
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Publication No.: US08524594B2Publication Date: 2013-09-03
- Inventor: Hiroshi Horikoshi
- Applicant: Hiroshi Horikoshi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2010-225090 20101004
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A method for manufacturing a solid-state imaging device includes: forming pixels that receive incident light in a pixel array area of a substrate; forming pad electrodes in a peripheral area located around the pixel array area of the substrate; forming a carbon-based inorganic film on an upper surface of each of the pad electrodes including a connection surface electrically connected to an external component; forming a coated film that covers upper surfaces of the carbon-based inorganic films; and forming an opening above the connection surface of each of the pad electrodes to expose the connection surface.
Public/Granted literature
- US20120080767A1 Solid-state imaging device, method for manufacturing the same, and electronic apparatus Public/Granted day:2012-04-05
Information query
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