Invention Grant
- Patent Title: Process for producing monomer for fluorinated resist
- Patent Title (中): 制备氟化抗蚀剂单体的方法
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Application No.: US13257193Application Date: 2010-04-26
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Publication No.: US08524941B2Publication Date: 2013-09-03
- Inventor: Shinya Akiba , Ryo Nadano , Yutaka Katsuhara
- Applicant: Shinya Akiba , Ryo Nadano , Yutaka Katsuhara
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2009-108480 20090427; JP2009-108488 20090427; JP2010-099313 20100423
- International Application: PCT/JP2010/057327 WO 20100426
- International Announcement: WO2010/125990 WO 20101104
- Main IPC: C07C69/653
- IPC: C07C69/653

Abstract:
According to the present invention, an α-substituted acrylic ester monomer for a fluorinated resist is produced by direct addition of an α-substituted acrylic acid to a fluorinated alkene in the presence of a specific acid catalyst having a sulfonyl group. By the use of such a specific acid catalyst, it is possible to achieve industrial-scale production of the α-substituted acrylic ester monomer for the fluorinated resist by carrying out the target addition reaction of the fluorinated alkene and the α-substituted acrylic acid efficiently during the occurrence of side reactions such as isomerization of the alkene, generation of a diol and excessive addition of the α-substituted acrylic acid.
Public/Granted literature
- US20120004444A1 Process for Producing Monomer for Fluorinated Resist Public/Granted day:2012-01-05
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