Invention Grant
- Patent Title: System and method of electron beam writing
- Patent Title (中): 电子束写入系统和方法
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Application No.: US12857388Application Date: 2010-08-16
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Publication No.: US08525135B2Publication Date: 2013-09-03
- Inventor: Dmitri Lanpanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
- Applicant: Dmitri Lanpanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group, LLP
- Main IPC: G03F1/16
- IPC: G03F1/16 ; G03F17/50 ; G03F1/00 ; G06F17/50
Abstract:
A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
Public/Granted literature
- US20110192994A1 SYSTEM AND METHOD OF ELECTRON BEAM WRITING Public/Granted day:2011-08-11
Information query
