Invention Grant
- Patent Title: Non-volatile variable resistance memory device and method of fabricating the same
- Patent Title (中): 非易失性可变电阻存储器件及其制造方法
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Application No.: US11797519Application Date: 2007-05-04
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Publication No.: US08525142B2Publication Date: 2013-09-03
- Inventor: El Mostafa Bourim , Eun-Hong Lee , Choong-Rae Cho
- Applicant: El Mostafa Bourim , Eun-Hong Lee , Choong-Rae Cho
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0040389 20060504
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
A non-volatile variable resistance memory device and a method of fabricating the same are provided. The non-volatile variable resistance memory device may include a lower electrode, a buffer layer on the lower electrode, an oxide layer on the buffer layer and an upper electrode on the oxide layer. The buffer layer may be composed of an oxide and the oxide layer may have variable resistance characteristics.
Public/Granted literature
- US20070290186A1 Non-volatile variable resistance memory device and method of fabricating the same Public/Granted day:2007-12-20
Information query
IPC分类: