Invention Grant
- Patent Title: Semiconductor light emission device for preventing a regional concentration phenomenon of a current flow and improving the reliability
- Patent Title (中): 用于防止电流的区域集中现象并提高可靠性的半导体发光装置
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Application No.: US12908198Application Date: 2010-10-20
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Publication No.: US08525150B2Publication Date: 2013-09-03
- Inventor: Min Ki Yoo , Koo Hwa Lee , Rok Hee Lee , Geun Woo Lee
- Applicant: Min Ki Yoo , Koo Hwa Lee , Rok Hee Lee , Geun Woo Lee
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2009-0100922 20091022
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00

Abstract:
A semiconductor light emission device is disclosed. The semiconductor light emission device includes: a substrate; a current concentration preventing pattern formed in a mesh net shape on the substrate; an n-type clad layer formed on the substrate loaded with the current concentration preventing pattern; an active layer and a p-type clad layer sequentially formed on the n-type clad layer; an n-type electrode formed on a part of the n-type clad layer which is exposed by partially etching the p-type clad layer and active layer; and a p-type electrode formed on the p-type clad layer. The current concentration preventing pattern is formed in a double layer structure which includes a first layer formed from one material of SiO and SiN and on the substrate, and a second layer formed from a metal material and on the first layer.
Public/Granted literature
- US20110095262A1 SEMICONDUCTOR LIGHT EMISSION DEVICE AND MANUFACTURING METHOD THE SAME Public/Granted day:2011-04-28
Information query
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