Invention Grant
- Patent Title: Single gate semiconductor device
- Patent Title (中): 单门半导体器件
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Application No.: US13180236Application Date: 2011-07-11
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Publication No.: US08525243B2Publication Date: 2013-09-03
- Inventor: Cheng-Chi Lin , Shih-Chin Lien , Chin-Pen Yeh , Shyi-Yuan Wu
- Applicant: Cheng-Chi Lin , Shih-Chin Lien , Chin-Pen Yeh , Shyi-Yuan Wu
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: H01L27/105
- IPC: H01L27/105

Abstract:
A semiconductor device has a gate multiple doping regions on both sides of the gate. The gate can be shared by a transistor and a capacitor.
Public/Granted literature
- US20110266601A1 Single Gate Semiconductor Device Public/Granted day:2011-11-03
Information query
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