Invention Grant
- Patent Title: Germanium compound, semiconductor device fabricated using the same, and methods of forming the same
- Patent Title (中): 锗化合物,使用其制造的半导体器件及其形成方法
-
Application No.: US11777854Application Date: 2007-07-13
-
Publication No.: US08525244B2Publication Date: 2013-09-03
- Inventor: Hye-Young Park , Myong-Woon Kim , Jin-Dong Kim , Choong-Man Lee , Jin-Il Lee
- Applicant: Hye-Young Park , Myong-Woon Kim , Jin-Dong Kim , Choong-Man Lee , Jin-Il Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec PA
- Priority: KR10-2006-0065987 20060713
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
A germanium (Ge) compound is provided. The Ge compound has a chemical formula GeR1xR2y. “R1” is an alkyl group, and “R2” is one of hydrogen, amino group, allyl group and vinyl group. “x” is greater than zero and less than 4, and the sum of “x” and “y” is equal to 4. Methods of forming the Ge compound, methods of fabricating a phase change memory device using the Ge compound, and phase change memory devices fabricated using the Ge compound are also provided.
Public/Granted literature
- US20080035906A1 GERMANIUM COMPOUND, SEMICONDUCTOR DEVICE FABRICATED USING THE SAME, AND METHODS OF FORMING THE SAME Public/Granted day:2008-02-14
Information query
IPC分类: