Invention Grant
- Patent Title: Wafer lens array and method for manufacturing the same
- Patent Title (中): 晶圆透镜阵列及其制造方法
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Application No.: US13044090Application Date: 2011-03-09
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Publication No.: US08525283B2Publication Date: 2013-09-03
- Inventor: Satoshi Yoneyama , Ryo Matsuno
- Applicant: Satoshi Yoneyama , Ryo Matsuno
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2010-053125 20100310
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A wafer lens array comprising a plurality of lens sections arranged one-dimensionally or two-dimensionally, a substrate section connecting the lens sections, and gap sections, wherein the lens surfaces in the lens section each have one or more curved surfaces; the gap section is a part projecting from outside than the inner edge of the lens section; and the inner surfaces of the gap sections are spread from a side near the lens section to the other side.
Public/Granted literature
- US20110221020A1 WAFER LENS ARRAY AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2011-09-15
Information query
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