Invention Grant
- Patent Title: Method of forming memory cell access device
- Patent Title (中): 形成存储单元访问装置的方法
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Application No.: US13168753Application Date: 2011-06-24
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Publication No.: US08525290B2Publication Date: 2013-09-03
- Inventor: Erh-Kun Lai , Hsiang-Lan Lung , Edward Kiewra
- Applicant: Erh-Kun Lai , Hsiang-Lan Lung , Edward Kiewra
- Applicant Address: TW Hsinchu US NY Armonk
- Assignee: Macronix International Co., Ltd.,International Business Machines Corporation
- Current Assignee: Macronix International Co., Ltd.,International Business Machines Corporation
- Current Assignee Address: TW Hsinchu US NY Armonk
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
A memory device includes an access device including a first doped semiconductor region having a first conductivity type, and a second doped semiconductor region having a second conductivity type opposite the first conductivity type. Both the first and the second doped semiconductor regions are formed in a single-crystalline semiconductor body, and define a p-n junction between them. The first and second doped semiconductor regions are implemented in isolated parallel ridges formed in the single-crystal semiconductor body. Each ridge is crenellated, and the crenellations define semiconductor islands; the first doped semiconductor region occupies a lower portion of the islands and an upper part of the ridge, and the second doped semiconductor region occupies an upper portion of the islands, so that the p-n junctions are defined within the islands.
Public/Granted literature
- US20120326265A1 METHOD OF FORMING MEMORY CELL ACCESS DEVICE Public/Granted day:2012-12-27
Information query
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