Invention Grant
US08525552B2 Semiconductor integrated circuit device having a plurality of standard cells for leakage current suppression
有权
具有用于泄漏电流抑制的多个标准单元的半导体集成电路器件
- Patent Title: Semiconductor integrated circuit device having a plurality of standard cells for leakage current suppression
- Patent Title (中): 具有用于泄漏电流抑制的多个标准单元的半导体集成电路器件
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Application No.: US13562144Application Date: 2012-07-30
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Publication No.: US08525552B2Publication Date: 2013-09-03
- Inventor: Takashi Ando , Keiichi Kusumoto , Kenji Shimazaki , Kazuyuki Nakanishi , Tetsurou Toubou
- Applicant: Takashi Ando , Keiichi Kusumoto , Kenji Shimazaki , Kazuyuki Nakanishi , Tetsurou Toubou
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-165306 20110728
- Main IPC: H01L25/00
- IPC: H01L25/00 ; H01L21/82 ; H03K19/00 ; H03K19/094

Abstract:
A semiconductor integrated circuit device includes cells A-1, B-1, and C-1 that have the same logic. Cell B-1 has cell width W2 larger than a cell width of cell A-1, but gate length L1 of a MOS transistor is equal to that of cell A-1. Cell C-1 has cell width W2 equal to a cell width of cell B-1, but has a MOS transistor having large gate length L2. A circuit delay of cell C-1 becomes large as compared with that of cells A-1 and B-1, but leak current becomes small. Therefore, by replacing cell A-1 adjacent to a space area with cell B-1, and by replacing cell B-1 in a path having room in timing with cell C-1, for example, leak current can be suppressed without increasing a chip area.
Public/Granted literature
- US20130027083A1 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE Public/Granted day:2013-01-31
Information query
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