Invention Grant
- Patent Title: Optimization of focused spots for maskless lithography
- Patent Title (中): 优化无掩模光刻的聚焦点
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Application No.: US12511345Application Date: 2009-07-29
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Publication No.: US08525972B2Publication Date: 2013-09-03
- Inventor: Paul Francis Michaloski
- Applicant: Paul Francis Michaloski
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Timothy M. Schaeberle
- Main IPC: G03B27/72
- IPC: G03B27/72
Abstract:
The focused spots of an active spot array projection system, such as a maskless lithographic projection system, are optimized within a relay of the projection system. A frequency modulator is positioned proximate to the pupil of the relay for reforming the focused spots while imaging the focused spots onto a photosensitive substrate.
Public/Granted literature
- US20100039630A1 OPTIMIZATION OF FOCUSED SPOTS FOR MASKLESS LITHOGRAPHY Public/Granted day:2010-02-18
Information query
