Invention Grant
US08526091B2 Aberration-correcting method, laser processing method using said aberration-correcting method, laser irradiation method using said aberration-correcting method, aberration-correcting device and aberration-correcting program 有权
畸变校正方法,使用所述像差校正方法的激光加工方法,使用所述像差校正方法的激光照射方法,像差校正装置和像差校正程序

  • Patent Title: Aberration-correcting method, laser processing method using said aberration-correcting method, laser irradiation method using said aberration-correcting method, aberration-correcting device and aberration-correcting program
  • Patent Title (中): 畸变校正方法,使用所述像差校正方法的激光加工方法,使用所述像差校正方法的激光照射方法,像差校正装置和像差校正程序
  • Application No.: US13061438
    Application Date: 2009-08-27
  • Publication No.: US08526091B2
    Publication Date: 2013-09-03
  • Inventor: Haruyasu ItoNaoya MatsumotoTakashi Inoue
  • Applicant: Haruyasu ItoNaoya MatsumotoTakashi Inoue
  • Applicant Address: JP Hamamatsu-shi, Shizuoka
  • Assignee: Hamamatsu Photonics K.K.
  • Current Assignee: Hamamatsu Photonics K.K.
  • Current Assignee Address: JP Hamamatsu-shi, Shizuoka
  • Agency: Drinker Biddle & Reath LLP
  • Priority: JPP2008-223582 20080901; JPP2009-125759 20090525
  • International Application: PCT/JP2009/064939 WO 20090827
  • International Announcement: WO2010/024320 WO 20100304
  • Main IPC: G02F1/01
  • IPC: G02F1/01 B23K26/00
Aberration-correcting method, laser processing method using said aberration-correcting method, laser irradiation method using said aberration-correcting method, aberration-correcting device and aberration-correcting program
Abstract:
In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as Δs.
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