Invention Grant
- Patent Title: Large area patterning of nano-sized shapes
- Patent Title (中): 纳米尺寸形状的大面积图案
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Application No.: US12616896Application Date: 2009-11-12
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Publication No.: US08529778B2Publication Date: 2013-09-10
- Inventor: Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
- Applicant: Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
- Applicant Address: US TX Austin US TX Austin
- Assignee: Molecular Imprints, Inc.,Board of Regents, The University of Texas System
- Current Assignee: Molecular Imprints, Inc.,Board of Regents, The University of Texas System
- Current Assignee Address: US TX Austin US TX Austin
- Agent Cameron A. King
- Main IPC: B44C1/22
- IPC: B44C1/22
Abstract:
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
Public/Granted literature
- US20100120251A1 Large Area Patterning of Nano-Sized Shapes Public/Granted day:2010-05-13
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