Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US12891422Application Date: 2010-09-27
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Publication No.: US08529823B2Publication Date: 2013-09-10
- Inventor: Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant: Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B28B11/10
- IPC: B28B11/10 ; G01B11/00

Abstract:
A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
Public/Granted literature
- US20110076352A1 IMPRINT LITHOGRAPHY Public/Granted day:2011-03-31
Information query
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