Invention Grant
- Patent Title: Fluoroalcohol containing molecular photoresist materials and processes of use
- Patent Title (中): 含氟分子光刻胶的材料及其使用方法
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Application No.: US12971292Application Date: 2010-12-17
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Publication No.: US08530136B2Publication Date: 2013-09-10
- Inventor: Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
- Applicant: Luisa D. Bozano , Gregory Breyta , Ekmini A. DeSilva , William D. Hinsberg , Ratnam Sooriyakumaran , Linda K. Sundberg
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/30 ; G03F7/38
Abstract:
Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
Public/Granted literature
- US20120156611A1 Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use Public/Granted day:2012-06-21
Information query
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