Invention Grant
- Patent Title: Silicate-free developer compositions
- Patent Title (中): 无硅酸盐显影剂组合物
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Application No.: US12948814Application Date: 2010-11-18
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Publication No.: US08530143B2Publication Date: 2013-09-10
- Inventor: Moshe Levanon , Leonid Askadsky
- Applicant: Moshe Levanon , Leonid Askadsky
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/32 ; B41N1/08 ; B41M5/00
Abstract:
A silicate-free alkaline aqueous developer composition has a pH of at least 12 and comprises a metal cation M2+ selected from barium, calcium, strontium, and zinc cations, and a chelating agent that has a complex formation constant (log K) for the metal cation of at least 3.5 and less than or equal to 4.5, and a log K for aluminum ion that is 7 or less. This developer composition can be used to process positive-working lithographic printing plate precursors to provide lithographic printing plates.
Public/Granted literature
- US20120129095A1 SILICATE-FREE DEVELOPER COMPOSITIONS Public/Granted day:2012-05-24
Information query
