Invention Grant
- Patent Title: Vertical silicide e-fuse
- Patent Title (中): 垂直硅化物电熔丝
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Application No.: US12904435Application Date: 2010-10-14
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Publication No.: US08530319B2Publication Date: 2013-09-10
- Inventor: Ephrem G. Gebreselasie , Joseph M. Lukaitis , Robert R. Robison , William R. Tonti , Ping-Chuan Wang
- Applicant: Ephrem G. Gebreselasie , Joseph M. Lukaitis , Robert R. Robison , William R. Tonti , Ping-Chuan Wang
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Gibb & Riley, LLC
- Agent Anthony J. Canale
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/44

Abstract:
An apparatus and a method of manufacturing an e-fuse includes a substrate, a patterned gate insulator on the substrate, and a patterned gate conductor on the patterned gate insulator. The patterned gate conductor has sidewalls and a top. A silicide contacts the sidewalls of the patterned gate conductor, the top of the patterned gate conductor, and a region of the substrate adjacent the patterned gate insulator and the patterned gate conductor.
Public/Granted literature
- US20120091556A1 VERTICAL SILICIDE E-FUSE Public/Granted day:2012-04-19
Information query
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