Invention Grant
US08530361B2 Process for producing silicon and oxide films from organoaminosilane precursors
有权
用于从有机氨基硅烷前体制备硅和氧化膜的方法
- Patent Title: Process for producing silicon and oxide films from organoaminosilane precursors
- Patent Title (中): 用于从有机氨基硅烷前体制备硅和氧化膜的方法
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Application No.: US12976041Application Date: 2010-12-22
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Publication No.: US08530361B2Publication Date: 2013-09-10
- Inventor: Manchao Xiao , Xinjian Lei , Heather Regina Bowen , Mark Leonard O'Neill
- Applicant: Manchao Xiao , Xinjian Lei , Heather Regina Bowen , Mark Leonard O'Neill
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Rosaleen P. Morris-Oskanian
- Main IPC: H01L21/31
- IPC: H01L21/31
Abstract:
A method for depositing a silicon containing film on a substrate using an organoaminosilane is described herein. The organoaminosilanes are represented by the formulas: wherein R is selected from a C1-C10 linear, branched, or cyclic, saturated or unsaturated alkyl group with or without substituents; a C5-C10 aromatic group with or without substituents, a C3-C10 heterocyclic group with or without substituents, or a silyl group in formula C with or without substituents, R1 is selected from a C3-C10 linear, branched, cyclic, saturated or unsaturated alkyl group with or without substituents; a C6-C10 aromatic group with or without substituents, a C3-C10 heterocyclic group with or without substituents, a hydrogen atom, a silyl group with substituents and wherein R and R1 in formula A can be combined into a cyclic group and R2 representing a single bond, (CH2)n chain, a ring, C3-C10 branched alkyl, SiR2, or SiH2.
Public/Granted literature
- US20110262642A1 Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors Public/Granted day:2011-10-27
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