Invention Grant
- Patent Title: Curable composition for imprints, patterning method and pattern
- Patent Title (中): 可印刷的组合物,图案化方法和图案
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Application No.: US12498403Application Date: 2009-07-07
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Publication No.: US08530540B2Publication Date: 2013-09-10
- Inventor: Kunihiko Kodama
- Applicant: Kunihiko Kodama
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-179986 20080710
- Main IPC: C08F20/22
- IPC: C08F20/22

Abstract:
A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.
Public/Granted literature
- US20100009287A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN Public/Granted day:2010-01-14
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