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US08530540B2 Curable composition for imprints, patterning method and pattern 有权
可印刷的组合物,图案化方法和图案

Curable composition for imprints, patterning method and pattern
Abstract:
A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.
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