Invention Grant
- Patent Title: Precursors for the polymer-assisted deposition of films
- Patent Title (中): 聚合物辅助沉积薄膜的前体
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Application No.: US12150627Application Date: 2008-04-29
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Publication No.: US08530554B1Publication Date: 2013-09-10
- Inventor: Thomas M. McCleskey , Anthony K. Burrell , Quanxi Jia , Yuan Lin
- Applicant: Thomas M. McCleskey , Anthony K. Burrell , Quanxi Jia , Yuan Lin
- Applicant Address: US NM Los Alamos
- Assignee: Los Alamos National Security, LLC
- Current Assignee: Los Alamos National Security, LLC
- Current Assignee Address: US NM Los Alamos
- Agent Bruce H. Cottrell; Samuel L. Borkowsky
- Main IPC: C08K5/16
- IPC: C08K5/16 ; C08K5/09 ; C08K3/10 ; C09C1/36
Abstract:
A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.
Public/Granted literature
- US20130217840A1 Precursors for the polymer-assisted deposition of films Public/Granted day:2013-08-22
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