Invention Grant
US08530596B2 Polymer for forming insulating film, composition for forming insulating film, insulating film, and electronic device having same
失效
用于形成绝缘膜的聚合物,用于形成绝缘膜的组合物,绝缘膜和具有该绝缘膜的电子器件
- Patent Title: Polymer for forming insulating film, composition for forming insulating film, insulating film, and electronic device having same
- Patent Title (中): 用于形成绝缘膜的聚合物,用于形成绝缘膜的组合物,绝缘膜和具有该绝缘膜的电子器件
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Application No.: US12694292Application Date: 2010-01-27
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Publication No.: US08530596B2Publication Date: 2013-09-10
- Inventor: Yohko Sano , Kazuyoshi Fujita , Sumitoshi Asakuma
- Applicant: Yohko Sano , Kazuyoshi Fujita , Sumitoshi Asakuma
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Bakelite Co., Ltd.
- Current Assignee: Sumitomo Bakelite Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2007-197482 20070730
- Main IPC: C09D5/25
- IPC: C09D5/25 ; C09D147/00 ; C08F36/00 ; C08F38/00

Abstract:
A polymer and composition useful in forming an insulating film provided with a low permittivity, a high heat resistance, and a high mechanical strength and an insulating film obtained from these and an electronic device having the same are provided. The polymer for forming an insulating film according to the present invention is characterized by being obtained by polymerizing a reactive compound represented by Formula (1). The insulating film according to the present invention is formed using a composition for forming an insulating film including that polymer, has molecular spaces having an average space size of 0.7 nm to 5 nm, and has a permittivity of 2.3 or less. The electronic device according to the present invention has the insulating film. (wherein R1, R2, and R3 are the same or different from each other and respectively represent an organic group having a ring structure; X and Y are the same or different from each other and respectively represent an aromatic organic group having a reactive group; and n represents 0 or 1).
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