Invention Grant
US08530598B2 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
有权
用于浸渍曝光的抗蚀剂组合物，抗蚀剂图案形成方法和含氟树脂
- Patent Title: Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
- Patent Title (中): 用于浸渍曝光的抗蚀剂组合物，抗蚀剂图案形成方法和含氟树脂
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Application No.: US13348989Application Date: 2012-01-12
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Publication No.: US08530598B2Publication Date: 2013-09-10
- Inventor: Masaru Takeshita , Yasuhiro Yoshii
- Applicant: Masaru Takeshita , Yasuhiro Yoshii
- Applicant Address: JP Kanagawa-ken
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPP2008-260864 20081007; JPP2008-308037 20081202
- Main IPC: C08F214/18
- IPC: C08F214/18 ; C08F220/68
Abstract:
A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.
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