Invention Grant
- Patent Title: Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound
- Patent Title (中): 化合物，含氟聚合物，辐射敏感性树脂组合物及其制备方法
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Application No.: US13216209Application Date: 2011-08-23
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Publication No.: US08530692B2Publication Date: 2013-09-10
- Inventor: Nobuji Matsumura , Yuusuke Asano , Hirokazu Sakakibara , Yukio Nishimura , Takehiko Naruoka
- Applicant: Nobuji Matsumura , Yuusuke Asano , Hirokazu Sakakibara , Yukio Nishimura , Takehiko Naruoka
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2009-039085 20090223
- Main IPC: C07C68/00
- IPC: C07C68/00 ; C07C69/96 ; C08F20/28 ; G03F7/039
Abstract:
A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.
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