Invention Grant
- Patent Title: Non-volatile semiconductor device
- Patent Title (中): 非易失性半导体器件
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Application No.: US13182696Application Date: 2011-07-14
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Publication No.: US08530877B2Publication Date: 2013-09-10
- Inventor: Junya Onishi , Shinobu Yamazaki , Kazuya Ishihara , Yushi Inoue , Yukio Tamai , Nobuyoshi Awaya
- Applicant: Junya Onishi , Shinobu Yamazaki , Kazuya Ishihara , Yushi Inoue , Yukio Tamai , Nobuyoshi Awaya
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2010-171079 20100729
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A variable resistance element that can stably perform a switching operation with a property variation being reduced by suppressing a sharp current that accompanies completion of forming process, and a non-volatile semiconductor memory device including the variable resistance element are realized. The non-volatile semiconductor memory device uses the variable resistance element for storing information in which a resistance changing layer is interposed between a first electrode and a second electrode, and a buffer layer is inserted between the first electrode and the resistance changing layer where a switching interface is formed. The buffer layer and the resistance changing layer include n-type metal oxides, and materials of the buffer layer and the resistance changing layer are selected such that energy at a bottom of a conduction band of the n-type metal oxide configuring the buffer layer is lower than that of the n-type metal oxide configuring the resistance changing layer.
Public/Granted literature
- US20120025163A1 NON-VOLATILE SEMICONDUCTOR DEVICE Public/Granted day:2012-02-02
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