Invention Grant
- Patent Title: Nonvolatile semiconductor memory device and method for manufacturing same
- Patent Title (中): 非易失性半导体存储器件及其制造方法
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Application No.: US13236744Application Date: 2011-09-20
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Publication No.: US08530955B2Publication Date: 2013-09-10
- Inventor: Hiromitsu Iino , Ryota Katsumata
- Applicant: Hiromitsu Iino , Ryota Katsumata
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-067636 20110325
- Main IPC: H01L29/792
- IPC: H01L29/792

Abstract:
According to one embodiment, a nonvolatile semiconductor memory device includes a memory cell array part, a first contact part, and a peripheral circuit part. The first contact part is juxtaposed with the memory cell array part in a first plane. The peripheral circuit part is juxtaposed with the memory cell array part in the first plane. The memory cell array part includes a first stacked body, a first semiconductor layer, and a memory film. The first contact part includes a first contact part insulating layer, and a plurality of first contact electrodes. The peripheral circuit part includes a peripheral circuit, a structure body, a peripheral circuit part insulating layer, and a peripheral circuit part contact electrode. A width along an axis perpendicular to the first axis of the peripheral circuit part insulating layer is smaller than a diameter of the first particle.
Public/Granted literature
- US20120241843A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2012-09-27
Information query
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