Invention Grant
US08531042B2 Technique for fabricating microsprings on non-planar surfaces 有权
在非平面表面上制造微球的技术

Technique for fabricating microsprings on non-planar surfaces
Abstract:
A processing technique facilitating the fabrication of the integrated circuit with microsprings at different vertical positions relative to a surface of a substrate is described. During the fabrication technique, microsprings are lithographically defined on surfaces of a first substrate and a second substrate. Then, a hole is created through a first substrate. Moreover, the integrated circuit may be created by rigidly mechanically coupling the two substrates to each other such that the microsprings on the surface of the second substrate are within a region defined at least in part by an edge around the hole. Subsequently, photoresist that constrains the microsprings on the surfaces of the two substrates may be removed. In this way, microsprings at the different vertical positions can be fabricated.
Public/Granted literature
Information query
Patent Agency Ranking
0/0