Invention Grant
US08531203B2 Mask alignment, rotation and bias monitor utilizing threshold voltage dependence
失效
掩模对准，旋转和偏置监视器利用阈值电压依赖
- Patent Title: Mask alignment, rotation and bias monitor utilizing threshold voltage dependence
- Patent Title (中): 掩模对准，旋转和偏置监视器利用阈值电压依赖
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Application No.: US12813804Application Date: 2010-06-11
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Publication No.: US08531203B2Publication Date: 2013-09-10
- Inventor: Todd A. Christensen , Matthew J. Paschal , John E. Sheets, II
- Applicant: Todd A. Christensen , Matthew J. Paschal , John E. Sheets, II
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Matthew J. Bussan
- Main IPC: G01R31/26
- IPC: G01R31/26
Abstract:
The present invention provides a method and apparatus for measuring alignment, rotation and bias of mask layers in semiconductor manufacturing by examining threshold voltage variation.
Public/Granted literature
- US20110304350A1 Mask Alignment, Rotation and Bias Monitor Utilizing Threshold Voltage Dependence Public/Granted day:2011-12-15
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