Invention Grant
US08531885B2 NAND-based 2T2b NOR flash array with a diode connection to cell's source node for size reduction using the least number of metal layers 失效
基于NAND的2T2b NOR闪存阵列,使用二极管连接到电池的源节点,使用最少数量的金属层进行尺寸减小

  • Patent Title: NAND-based 2T2b NOR flash array with a diode connection to cell's source node for size reduction using the least number of metal layers
  • Patent Title (中): 基于NAND的2T2b NOR闪存阵列,使用二极管连接到电池的源节点,使用最少数量的金属层进行尺寸减小
  • Application No.: US13116002
    Application Date: 2011-05-26
  • Publication No.: US08531885B2
    Publication Date: 2013-09-10
  • Inventor: Fu-Chang HsuPeter Wung Lee
  • Applicant: Fu-Chang HsuPeter Wung Lee
  • Applicant Address: US CA San Jose
  • Assignee: Aplus Flash Technology, Inc.
  • Current Assignee: Aplus Flash Technology, Inc.
  • Current Assignee Address: US CA San Jose
  • Main IPC: G11C11/34
  • IPC: G11C11/34
NAND-based 2T2b NOR flash array with a diode connection to cell's source node for size reduction using the least number of metal layers
Abstract:
A NAND-based NOR flash memory array has a matrix of NAND-based NOR flash cells arranged in rows and columns. Every two adjacent NAND-based NOR flash cells in a column share a common source node which is connected to a common source line through a diode. The source line may be made of a metal layer and is in contact directly with the source node or through an ohmic contact to form a Schottky barrier diode. The source line may also be made of a polysilicon or metal layer and connected to the source node through a pillar-structured polysilicon diode and a conduction layer. The diode may also be formed in the source node by enclosing a P/N+ junction diode in a heavily N+ doped region of the source node.
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