Invention Grant
- Patent Title: Method and system for stencil design for particle beam writing
- Patent Title (中): 粒子束写入模板设计方法和系统
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Application No.: US13607708Application Date: 2012-09-08
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Publication No.: US08533640B2Publication Date: 2013-09-10
- Inventor: Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
- Applicant: Dmitri Lapanik , Shohei Matsushita , Takashi Mitsuhashi , Zhigang Wu
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Mueller Law Office, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.
Public/Granted literature
- US20130007675A1 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING Public/Granted day:2013-01-03
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