Invention Grant
- Patent Title: Film forming apparatus, film forming method and storage medium
- Patent Title (中): 成膜装置,成膜方法和储存介质
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Application No.: US12593502Application Date: 2008-03-13
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Publication No.: US08539908B2Publication Date: 2013-09-24
- Inventor: Toshio Takagi
- Applicant: Toshio Takagi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-082533 20070327
- International Application: PCT/JP2008/054635 WO 20080313
- International Announcement: WO2008/117675 WO 20081002
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52 ; C23F1/00 ; H01L21/306 ; G05B15/00 ; G06F17/00 ; C23C16/06 ; C23C16/22

Abstract:
A film forming apparatus includes a processing chamber, and a mounting table disposed in the processing chamber to mount a substrate thereon. The film forming apparatus further includes a gas shower head having gas supply holes and including a central region facing a central portion of the substrate and a peripheral region facing a peripheral portion of the substrate, a first processing gas supply unit for supplying a first processing gas to the central region, a second processing gas supply unit for supplying a second processing gas to the central region, an energy supply unit for supplying energy to react the first processing gas with the second processing gas on the substrate, and a purge gas supply unit for supplying a purge gas to the central region and the peripheral region when one of the first and the second processing gas is switched by the other.
Public/Granted literature
- US20100119727A1 FILM FORMING APPARATUS, FILM FORMING METHOD AND STORAGE MEDIUM Public/Granted day:2010-05-13
Information query
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