Invention Grant
US08541148B2 Method for making a laminated chip and method for aligning a lithographic mask 有权
制造层压芯片的方法和用于对准光刻掩模的方法

  • Patent Title: Method for making a laminated chip and method for aligning a lithographic mask
  • Patent Title (中): 制造层压芯片的方法和用于对准光刻掩模的方法
  • Application No.: US13092766
    Application Date: 2011-04-22
  • Publication No.: US08541148B2
    Publication Date: 2013-09-24
  • Inventor: Chi-Chi Huang
  • Applicant: Chi-Chi Huang
  • Applicant Address: TW Taichung
  • Assignee: Max Echo Technology Corporation
  • Current Assignee: Max Echo Technology Corporation
  • Current Assignee Address: TW Taichung
  • Priority: TW99113087A 20100426
  • Main IPC: H01L21/00
  • IPC: H01L21/00
Method for making a laminated chip and method for aligning a lithographic mask
Abstract:
A method for making a laminated chip includes: (a) forming a first conductive layer on a substrate; (b) forming an insulating layer on the first conductive layer opposite to the substrate; (c) bombarding the insulating layer using an electron beam to form a plurality of holes that expose the first conductive layer; and (d) forming a second conductive layer on the insulating layer such that a part of the second conductive layer extends into the holes to electrically connect to the first conductive layer.
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