Invention Grant
US08541148B2 Method for making a laminated chip and method for aligning a lithographic mask
有权
制造层压芯片的方法和用于对准光刻掩模的方法
- Patent Title: Method for making a laminated chip and method for aligning a lithographic mask
- Patent Title (中): 制造层压芯片的方法和用于对准光刻掩模的方法
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Application No.: US13092766Application Date: 2011-04-22
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Publication No.: US08541148B2Publication Date: 2013-09-24
- Inventor: Chi-Chi Huang
- Applicant: Chi-Chi Huang
- Applicant Address: TW Taichung
- Assignee: Max Echo Technology Corporation
- Current Assignee: Max Echo Technology Corporation
- Current Assignee Address: TW Taichung
- Priority: TW99113087A 20100426
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for making a laminated chip includes: (a) forming a first conductive layer on a substrate; (b) forming an insulating layer on the first conductive layer opposite to the substrate; (c) bombarding the insulating layer using an electron beam to form a plurality of holes that expose the first conductive layer; and (d) forming a second conductive layer on the insulating layer such that a part of the second conductive layer extends into the holes to electrically connect to the first conductive layer.
Public/Granted literature
- US20110263122A1 Method For Making A Laminated Chip And Method For Aligning a Lithographic Mask Public/Granted day:2011-10-27
Information query
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